| 000 | 00659 a2200229 4500 | ||
|---|---|---|---|
| 003 | GCWUF | ||
| 005 | 20210119215731.0 | ||
| 008 | 210119b xxu||||| |||| 00| 0 eng d | ||
| 020 | _a9780471720010 | ||
| 040 | _cMAIN | ||
| 082 |
_a530.44 _bLIE |
||
| 100 |
_aLieberman, Michael A. _94850 |
||
| 245 | _aPRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING / | ||
| 250 | _a2ND ED. | ||
| 260 |
_c2005. _aCanada: _bWiley, |
||
| 300 |
_a757 p. : _bill ; _c24 cm. _fH.B. |
||
| 500 | _aInclude Index | ||
| 650 |
_aPlasma dynamics _vPlasma chemistry _94851 |
||
| 650 |
_aThin films--Surfaces _94852 |
||
| 700 |
_aLichtenberg, Allan J. _94481 |
||
| 942 |
_2ddc _cBK |
||
| 999 |
_c11499 _d11499 |
||