| 000 | 00653 a2200229 4500 | ||
|---|---|---|---|
| 003 | GCWUF | ||
| 005 | 20200929032902.0 | ||
| 008 | 200929b xxu||||| |||| 00| 0 eng d | ||
| 020 | _a9780471720010 | ||
| 040 |
_bENG _cMAIN |
||
| 082 |
_a530.44 _bLIE |
||
| 100 |
_a Lieberman, M. A. _94478 |
||
| 245 | _aPrinciples of Plasma Discharges and Material Processing / | ||
| 250 | _a2nd ed. | ||
| 260 |
_aCanada: _bWiley-interscience, _c2005. |
||
| 300 |
_axxxv, 757p. : _bill; _c25 cm. _fH.B. |
||
| 500 | _aInclude Index | ||
| 650 |
_aPlasma dynamics _94479 |
||
| 650 |
_vPlasma etching _94480 |
||
| 700 |
_aLichtenberg, Allan J. _94481 |
||
| 942 |
_2ddc _cBK |
||
| 999 |
_c11154 _d11154 |
||